IMEC tips early EUV results, readies for preproduction tool

November 2007
Microlithography World;Nov2007, Vol. 16 Issue 4, p16
Trade Publication
No abstract available.


Related Articles

  • Prospects and challenges of optical RET. Fritze, Michael; Tyrrell, Brian // Solid State Technology;Feb2003, Vol. 46 Issue 2, p61 

    Focuses on advancements in resolution enhancement technology (RET) in optical lithography. Commonly-used RET methods; Challenges of optical RET; Competing approaches to RET. INSET: OVERVIEW.

  • Exploiting design regularity for optical RET lithography. Fritze, Michael; Tyrrell, Brian // Solid State Technology;Aug2004, Vol. 47 Issue 8, p26 

    Examines design regularity for optical resolution-enhancement techniques (RET) lithography. Progress in immersion lithography; Change in design approach; Assessment of design practices.

  • SPIE REPORT Immersion lithography targets 'hyper NA' and high 300mm throughput.  // Solid State Technology;May2005, Vol. 48 Issue 5, p4 

    The article focuses on immersion lithography and scanners. With no developments identified yet in immersion lithography, rival scanner makers Canon Inc. and Nikon Inc. are accelerating efforts to take 193nm wet exposure tools to the next level, quickly pushing numerical aperture lenses to their...

  • Optimized illumination settings extend ArF lithography to 65nm. Shu-Hao Hsu; Shu-Ping Fang; Huang, I.H.; Benjamin Szu-Min Lin; Kuei-Chun Hung // Solid State Technology;Aug2004, Vol. 47 Issue 8, p39 

    Focuses on the effects of optimized illumination settings on argon-fluoride lithography (ArF). Extension of 193nm ArF lithography to 65nm processes; Need for resolution-enhancement techniques to apply ArF tools; Effects in the extensions of 193nm lithography; Description of poly-gate patterning.

  • Beam pen lithography. Fengwei Huo; Gengfeng Zheng; Xing Liao; Giam, Louise R.; Jinan Chai; Xiaodong Chen; Wooyoung Shim; Mirkin, Chad A. // Nature Nanotechnology;Sep2010, Vol. 5 Issue 9, p637 

    Lithography techniques are currently being developed to fabricate nanoscale components for integrated circuits, medical diagnostics and optoelectronics. In conventional far-field optical lithography, lateral feature resolution is diffraction-limited. Approaches that overcome the diffraction...

  • Ultrahigh resolution of calixarene negative resist in electron beam lithography. Fujita, J.; Ohnishi, Y. // Applied Physics Letters;2/26/1996, Vol. 68 Issue 9, p1297 

    Investigates the resolution of the calixarene derivative (hexaacetate p-methnylcalix[6]arene) (MC6AOAc) using electron beam lithography. Characteristics and basic component of MC6AOAc; Techniques used for handling MC6AOAc as a high-resolution negative resist; Observation on the resist surface...

  • Immersion objective achieves 60nm resolution.  // Solid State Technology;Aug2004, Vol. 47 Issue 8, p77 

    Focuses on the numerical aperture of the Leica DUV AT WI water immersion objective for deep-ultraviolet lithography applications. Offer of high resolution; Achievement of linewidth resolution for measuring CDs in transmission on various types of photomasks; Stability of the system.

  • Direct and subdiffraction-limit laser nanofabrication in silicon. Huang, S. M.; Hong, M. H.; Luk’yanchuk, B. S.; Chong, T. C. // Applied Physics Letters;6/30/2003, Vol. 82 Issue 26, p4809 

    We propose a method for nanofabrication at a resolution much below the diffraction limit for projection optical lithography using a backside-irradiation method. Feature sizes below λ/260 have been achieved in silicon. An infrared laser (CO[SUB2] λ = 10.6 mμ) was used to illuminate the...

  • Fabrication of Stampers for molding Polymeric Sieves using Optical and Holographic Lithography. Gutierrez-Rivera, Luis E.; Cescato, Lucila // AIP Conference Proceedings;4/15/2008, Vol. 992 Issue 1, p340 

    Polymeric sieves are important devices for biological applications. Such sieves can be produced by casting a stamper (or master). In this paper we develop two different processes for fabrication of PDMS stampers using optical and holographic lithography. The first process starts with the...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics