Mask industry survey: Steady as she goes, no icebergs ahead

M. D. L.
November 2007
Microlithography World;Nov2007, Vol. 16 Issue 4, p16
Trade Publication
No abstract available.


Related Articles

  • Elusive mask defects: The false defect. Reynolds, James A. // Solid State Technology;Feb95, Vol. 38 Issue 2, p81 

    Focuses on the false or nuisance defect in photomasks. Effect on the speed, sensitivity and accuracy of die-to-database reticle inspection; Specification of how many nuisance defects must be separated from real defects during the defect classification process; Fracturing of the mask design data...

  • Do Maskmakers Need Uncle Sam? Chappell, Jeff // Electronic News;7/1/2002, Vol. 48 Issue 27, p10 

    Talks about the U.S. reticle business as of 2002. Idea of government involvement in the business; Cost of photomask overhead; Institute approach to technology research and development; Functions of the National Nanotechnology Initiative.

  • Fab planning.  // Solid State Technology;May2002, Vol. 45 Issue 5, p62 

    Deals with the increased sensitivity of reticles to handling and other damages. Use of automated reticle sorting, stocking and delivery systems in fabs.

  • Trends in the mask industry. Grady, Edward C.; Kettering, David E. // Solid State Technology;Mar95, Vol. 38 Issue 3, p32 

    Reports on the factors affecting the demand for masks needed in the American semiconductor industry. Trend in the shrinking of integrated circuits; Increase in the integration of functions; Increase in the size of chips and reticles; Growth of the integrated circuit industry.

  • Mask defects discussed at BACUS round table. M.D.L. // Solid State Technology;Sep96, Vol. 39 Issue 9, p58 

    Reports on the `Presidents in the Flood' roundtable at the Semicon West Exhibition for 1996 focusing on the business aspects of photomask defects. Issue of defects on delivered masks; Prospects for the solution to the defects.

  • Stylus nanoprofilometry for mask metrology. Moloni, Katerina; Morrison, Troy // Microlithography World;Aug2004, Vol. 13 Issue 3, p18 

    Examines the characterization of three-dimensional structures of advanced reticles using a stylus nanoprofilometer (SNP) photomask metrology. Way of extending the capability of lithography steppers; Background on SNP; Requirements for measuring critical dimensions. INSET: Extracting profile...

  • Photomask Industry Needs to Integrate Across Litho Plane.  // Electronic News;6/30/2003, Vol. 49 Issue 26, pN.PAG 

    Presents information on the actions that should be taken by the U.S. photomask industry to see integration across the lithography plane, highlighted at the Advanced Reticle Symposium 2003. Benefits of integrating the lithography plane; Means to address the escalating costs of decreasing geometries.

  • KLA-Tencor Launches Photomask Verification System.  // Electronic News;5/12/2003, Vol. 49 Issue 19, pN.PAG 

    Reports on the introduction of the Process Window Qualification (PWQ) reticle design verification system from KLA-Tencor. Functions of the PWQ; Statement from Burn Lin of Taiwan Semiconductor Manufacturing Co. about the extension of the optical lithography to the 90 nanometer node; Key features...

  • Keep Your M145's Light Shining.  // PS: Preventive Maintenance Monthly;Jul2006, Issue 644, p17 

    The article provides information on the light of the M145 machine gun optic. It states that machine guns have illuminated reticle for low-light sighting. It instructs machine gunners to turn the rotary switch to off when reticle light is not needed. It also reminds the gunner that the reticle...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics