TITLE

Toshiba validates 22-nm CMOS imprint litho

AUTHOR(S)
Mutschler, Ann Steffora
PUB. DATE
October 2007
SOURCE
Electronic News;10/22/2007, Vol. 53 Issue 43, p20
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article reports that Japanese semiconductor company Toshiba Semiconductor Co. validated the use of imprint lithography technology from Molecular Imprints Inc. (MII) in the development of 22-nm CMOS devices, and has fabricated narrow trench features at dimensions down to 18-nm. Toshiba has confirmed enhancements in the areas of imaging, defectivity and overlay control. MII believes its S-FIL technology is a viable solution for critical device layer applications at the 32-nm node, and a superior solution at and beyond the 22-nm node.
ACCESSION #
27296198

 

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