Toshiba validates 22-nm CMOS imprint litho

Mutschler, Ann Steffora
October 2007
Electronic News;10/22/2007, Vol. 53 Issue 43, p20
Trade Publication
The article reports that Japanese semiconductor company Toshiba Semiconductor Co. validated the use of imprint lithography technology from Molecular Imprints Inc. (MII) in the development of 22-nm CMOS devices, and has fabricated narrow trench features at dimensions down to 18-nm. Toshiba has confirmed enhancements in the areas of imaging, defectivity and overlay control. MII believes its S-FIL technology is a viable solution for critical device layer applications at the 32-nm node, and a superior solution at and beyond the 22-nm node.


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