TITLE

Toppan, CEA-Leti to study double patterning

AUTHOR(S)
Mutschler, Ann Steffora
PUB. DATE
September 2007
SOURCE
Electronic News;9/24/2007, Vol. 53 Issue 39, p23
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article reports that Toppan Photomasks Inc. and technology R&D organization Electronics and Information Technology Laboratory of the French Atomic Energy Commission (CEA-Leti) will explore double patterning techniques under a joint development agreement. The Toppan-CEA Leti partnership is one of several double-patterning development projects that Toppan is participating in, and will leverage Toppan's global manufacturing and research facilities.
ACCESSION #
26886335

 

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