TITLE

Laser produced plasma light source for EUVL

AUTHOR(S)
Mizoguchi, Hakaru
PUB. DATE
August 2007
SOURCE
Microlithography World;Aug2007, Vol. 16 Issue 3, p14
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article deals with the extreme ultraviolet (EUV) lithography, a potential solution for lithography exposure tools at the 32nm node. It mentions the advantages of the plasma light sources (LPP) design. A DPP source generates the EUV emitting plasma via a low pressure gas discharge between or near two electrodes, whereas a LPP uses a laser to generate the hot dense plasma via irradiation of a target.
ACCESSION #
26363564

 

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