TITLE

Double patterning lithography for DRAM

AUTHOR(S)
Seo-Min Kim; Sun-Young Koo; Chang-Moon Lim
PUB. DATE
August 2007
SOURCE
Microlithography World;Aug2007, Vol. 16 Issue 3, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article examines double patterning lithography (DPL) for DRAM layout. DPL is performed using two cycles of lithography and etching processes. It notes that the cell patterns in DRAM are characterized by island patterns, dense contact holes and dense line patterns. The positive tone and the negative tone are the two types of layout preparation methods in DPL.
ACCESSION #
26363561

 

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