Double patterning lithography for DRAM

Seo-Min Kim; Sun-Young Koo; Chang-Moon Lim
August 2007
Microlithography World;Aug2007, Vol. 16 Issue 3, p4
Trade Publication
The article examines double patterning lithography (DPL) for DRAM layout. DPL is performed using two cycles of lithography and etching processes. It notes that the cell patterns in DRAM are characterized by island patterns, dense contact holes and dense line patterns. The positive tone and the negative tone are the two types of layout preparation methods in DPL.


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