TITLE

Fused-silica gratings broaden diffraction applications

PUB. DATE
July 2007
SOURCE
Laser Focus World;Jul2007, Vol. 43 Issue 7, p11
SOURCE TYPE
Periodical
DOC. TYPE
Article
ABSTRACT
The article reports on the use of convention photoresist-patterning techniques and semiconductor-etching technology by scientists at Ibsen Photonics for fabricating low-cost, high-quality transmissive diffraction gratings in fused silica. A holographic stepper was used to fabricate a grating pattern in photoresist. The fused-silica diffraction gratings are particularly suited to laser-pulse-compression applications.
ACCESSION #
25844359

 

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