TITLE

Advanced Energy keeps pace with plasma-impedance changes

AUTHOR(S)
Mutschler, Ann Steffora
PUB. DATE
July 2007
SOURCE
Electronic News;7/9/2007, Vol. 53 Issue 28, p23
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article reports that Advanced Energy Industries Inc. has detailed its Paramount RF-power delivery system meant to allow faster transitions, shorter process steps and reduced process times. The company said that the 3 kW Paramount system is aimed at delivering accurate power control for increasingly complex film stacks and fine feature sizes in both etch and deposition processes in semiconductor, FPD, MEMS and solar photovoltaic manufacturing.
ACCESSION #
25832592

 

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