TITLE

Line-edge roughness, Part 2

AUTHOR(S)
Mack, Chris A.
PUB. DATE
May 2007
SOURCE
Microlithography World;May2007, Vol. 16 Issue 2, p12
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article describes the use of stochastic modeling to examine the variability of photoacid generator concentration in the resists. The effect of diffusion on the uncertainty of acid concentration is discussed. The results showed that the mean value and the standard deviation of acid concentration change as the volume in the microresists changes and the standard deviation of acid concentration is higher if the number of photoacid generators originally in the volume is lower.
ACCESSION #
25237114

 

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