Line-edge roughness, Part 2

Mack, Chris A.
May 2007
Microlithography World;May2007, Vol. 16 Issue 2, p12
Trade Publication
The article describes the use of stochastic modeling to examine the variability of photoacid generator concentration in the resists. The effect of diffusion on the uncertainty of acid concentration is discussed. The results showed that the mean value and the standard deviation of acid concentration change as the volume in the microresists changes and the standard deviation of acid concentration is higher if the number of photoacid generators originally in the volume is lower.


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