TITLE

SEM contour-based OPC model calibration

AUTHOR(S)
Bailey, George E.
PUB. DATE
May 2007
SOURCE
Microlithography World;May2007, Vol. 16 Issue 2, p9
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article describes the accuracy and stability of an automated model calibration technique utilizing scanning electron microscope (SEM) contours for microlithography processes. The benefits of SEM-contour over the critical dimension-based method include providing more diverse topological information for model calibration and saving time in engineering. The areas where engineering time is reduced or eliminated in an automated calibration process is provided.
ACCESSION #
25237113

 

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