SEM contour-based OPC model calibration

Bailey, George E.
May 2007
Microlithography World;May2007, Vol. 16 Issue 2, p9
Trade Publication
The article describes the accuracy and stability of an automated model calibration technique utilizing scanning electron microscope (SEM) contours for microlithography processes. The benefits of SEM-contour over the critical dimension-based method include providing more diverse topological information for model calibration and saving time in engineering. The areas where engineering time is reduced or eliminated in an automated calibration process is provided.


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