TITLE

Self-assembled resists for nanolithography

AUTHOR(S)
Ross, C. A.
PUB. DATE
May 2007
SOURCE
Microlithography World;May2007, Vol. 16 Issue 2, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article describes a self-assembly of block copolymers for nanolithography applications. The diblock copolymers are made of two immiscible polymer chains that covalently bonded together such as polystyrene and polymethyl methacrylate. However, the geometries of block copolymer patterns are not limited to arrays of spheres, cylinders and lamellae. The patterning using self-assembled block copolymers for nanolithography is discussed.
ACCESSION #
25237112

 

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