Rohm and Haas make Harvard move

April 2007
ICIS Chemical Business;4/2/2007, Vol. 2 Issue 60, p33
Trade Publication
This article states that Rohm and Haas has licensed a novel class of metal amidinate compounds from Harvard University. The compounds can be used for making thin films of metals and metal compounds by atomic layer deposition (ALD). As features on electronic chips drop below 43 nanometers, ALD is set to be a vital technology because of the control it affords. Rohm and Haas Electronic Materials will produce the compounds at its facility in North Andover, Massachusetts.


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