TITLE

Luminescent scores second patent for inverse litho technology

AUTHOR(S)
Taylor, Colleen
PUB. DATE
April 2007
SOURCE
Electronic News;4/16/2007, Vol. 53 Issue 16, p45
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article reports on the second patent for the inverse lithography technology (ILT) received by lithography-enhancement products provider Luminescent Technologies Inc. from the U.S. Patent and Trademark Office on February 13, 2007. The use of level-set methods when applied to advanced lithography applications is covered by the patent. The methods represent one of the key components of ILT according to the company. It claims that it is optimizing the technique to build mask-synthesis solutions.
ACCESSION #
24834739

 

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