Hafnium gives Moore's Law new life

March 2007
InTech;Mar2007, Vol. 54 Issue 3, p11
The article reports that IBM and Intel separately announced a new type of transistor material, termed hafnium, which would result in smaller chips, increased computing performance and more energy-efficient computers in 2007. Hafnium will replace silicon dioxide as the material to be used in a transistor component called the gate dielectric. The gate itself, which is made of polysilicon, will be made from a new material which IBM and Intel are not naming. These new materials would allow 20% more current in the chip thus translating into a 20% increase in performance.


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