TITLE

Mix-and-match e-beam/DUV lithography

AUTHOR(S)
Pfeiffer, Hans C.
PUB. DATE
February 2007
SOURCE
Microlithography World;Feb2007, Vol. 16 Issue 1, p15
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article highlights the combined use of electron beam and deep ultraviolet (DUV) lithography systems in the exploration of designs in leading edge production. Among the factors that made electron beam direct write pattern generation more important are the proliferation of application-specific integrated circuits and shortened life cycle. Line edge shortening and corner rounding will be the most important issues in the sub-45nanometer complementary metal oxide semiconductor manufacturing processes and single exposure DUV.
ACCESSION #
24121368

 

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