Correcting ACLV by mask substrate tuning

Gottlieb, Gidi; Graitzer, Erez; Ben-Zvi, Guy; Turnquist, Bill
February 2007
Microlithography World;Feb2007, Vol. 16 Issue 1, p10
Trade Publication
The article discusses the mask substrate tuning process in correcting across-chip linewidth variation (ACLV). It is said that the fine-tuning method that involves CD control technology with femtosecond lasers can make lithography processes more robust and extend the lifetimes of existing reticles. An ozone of structural change arises from the interaction of the shock wave with the cold atoms around it and the rapid cooling of the plasma.


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