TITLE

Correcting ACLV by mask substrate tuning

AUTHOR(S)
Gottlieb, Gidi; Graitzer, Erez; Ben-Zvi, Guy; Turnquist, Bill
PUB. DATE
February 2007
SOURCE
Microlithography World;Feb2007, Vol. 16 Issue 1, p10
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article discusses the mask substrate tuning process in correcting across-chip linewidth variation (ACLV). It is said that the fine-tuning method that involves CD control technology with femtosecond lasers can make lithography processes more robust and extend the lifetimes of existing reticles. An ozone of structural change arises from the interaction of the shock wave with the cold atoms around it and the rapid cooling of the plasma.
ACCESSION #
24121366

 

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