TITLE

Immersion lithography for 45nm manufacturing

AUTHOR(S)
Owa, S.; Hazelton, A.; Magoon, H.
PUB. DATE
February 2007
SOURCE
Microlithography World;Feb2007, Vol. 16 Issue 1, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article focuses on the use of immersion lithography in 45 nanometer manufacturing. Immersion lithography should deliver superior imaging performance without negatively impacting yield to ensure its success in high volume manufacturing. It is said that the manufacturing imperfections have made catadioptric lenses more difficult to design. Pollarized illumination is significant in a hyper numerical aperture (NA) lithography.
ACCESSION #
24121365

 

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