TITLE

Optical nonlinearity of oxygen-rich SiOx thin films

AUTHOR(S)
Li, W. T.; Boswell, R.; Samoc, M.; Samoc, A.; Qin, Q. H.
PUB. DATE
February 2007
SOURCE
Electronics Letters;2/15/2007, Vol. 43 Issue 4, p235
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Highly oxygen-rich SiOx thin films were prepared using a helicon plasma activated reactive evaporation technique. A small second-order optical nonlinearity was observed in the as-grown films, and thermal poling induced nonlinearity in the films was found to be much larger than that in stoichiometric SiO2 films. These phenomena were associated with the non-impurity defects in the oxygen-rich films.
ACCESSION #
24029867

 

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