TITLE

Epitaxial growth and orientation of AlN thin films on Si(001) substrates deposited by reactive magnetron sputtering

AUTHOR(S)
Valcheva, E.; Birch, J.; Persson, P. O. Å.; Tungasmita, S.; Hultman, L.
PUB. DATE
December 2006
SOURCE
Journal of Applied Physics;12/15/2006, Vol. 100 Issue 12, p123514
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Epitaxial domain formation and textured growth in AlN thin films deposited on Si(001) substrates by reactive magnetron sputtering was studied by transmission electron microscopy and x-ray diffraction. The films have a wurtzite type structure with a crystallographic orientation relationship to the silicon substrate of AlN(0001)∥Si(001). The AlN film is observed to nucleate randomly on the Si surface and grows three dimensionally, forming columnar domains. The in-plane orientation reveals four domains with their a axes rotated by 15° with respect to each other: AlN<1120>∥Si[110], AlN<0110>∥Si[110], AlN<1120>∥Si[100], and AlN<0110>∥Si[100] An explanation of the growth mode based on the large lattice mismatch and the topology of the substrate surface is proposed.
ACCESSION #
23624504

 

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics