TITLE

NEWS & PRODUCTS

PUB. DATE
November 2006
SOURCE
Microlithography World;Nov2006, Vol. 15 Issue 4, p18
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article offers news briefs related to lithography. Several researchers from Sematech North announced that they have successfully patterned features narrower than 45 nanometer in multiple orientations using 193 nanometer immersion lithography and azimuthal polarization. JSR Micro Inc. has purchased a 300 millimeter RF3 track system from Sokudo Co. Ltd. Cadence Design Systems Inc. has developed a lithography-aware design flow that links resolution enhancement technologies with physical design and verification.
ACCESSION #
23251690

 

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