The impact of laser spectrum on lithography

Inoue, Hirotoshi; Enami, Tatsuo; Takahisa, Kenji
November 2006
Microlithography World;Nov2006, Vol. 15 Issue 4, p4
Trade Publication
The article discusses the impact of laser spectrum on lithography. It offers information on which parameter of the spectrum is most important for lithography and how variations of its width can be minimized. The author notes that the width and stability of the laser spectrum affect critical dimension control, bias and yield in the low k1 lithography.


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