TITLE

The impact of laser spectrum on lithography

AUTHOR(S)
Inoue, Hirotoshi; Enami, Tatsuo; Takahisa, Kenji
PUB. DATE
November 2006
SOURCE
Microlithography World;Nov2006, Vol. 15 Issue 4, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article discusses the impact of laser spectrum on lithography. It offers information on which parameter of the spectrum is most important for lithography and how variations of its width can be minimized. The author notes that the width and stability of the laser spectrum affect critical dimension control, bias and yield in the low k1 lithography.
ACCESSION #
23251686

 

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