Diffusion and resolution for chemically amplified resists

Mack, Chris A.
August 2006
Microlithography World;Aug2006, Vol. 15 Issue 3, p17
Trade Publication
The article provides information on diffusion and resolution for chemically amplified resists. It compares the effects of pure diffusion with reaction-diffusion on the amplitudes of the Fourier coefficients. It describes the effect of diffusion on the latent image frequency components for a dense line, comparing pure diffusion to reaction diffusion.


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