TITLE

Diffusion and resolution for chemically amplified resists

AUTHOR(S)
Mack, Chris A.
PUB. DATE
August 2006
SOURCE
Microlithography World;Aug2006, Vol. 15 Issue 3, p17
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article provides information on diffusion and resolution for chemically amplified resists. It compares the effects of pure diffusion with reaction-diffusion on the amplitudes of the Fourier coefficients. It describes the effect of diffusion on the latent image frequency components for a dense line, comparing pure diffusion to reaction diffusion.
ACCESSION #
22079950

 

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