TITLE

Characterizing scanner illuminators to match OPC

AUTHOR(S)
Renwick, S.; Nishinaga, H.; Magoon, H.
PUB. DATE
August 2006
SOURCE
Microlithography World;Aug2006, Vol. 15 Issue 3, p14
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The illuminator profiles of different exposure tools produce different optical proximity effects (OPE) even when the nominal illumination parameters are the same. Universal metrics for characterizing the illuminator enable lithographers to compensate for the illuminator-related optical proximity correction (OPC) differences, avoiding the need for tool-specific OPC solutions.
ACCESSION #
22079949

 

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