Characterizing scanner illuminators to match OPC

Renwick, S.; Nishinaga, H.; Magoon, H.
August 2006
Microlithography World;Aug2006, Vol. 15 Issue 3, p14
Trade Publication
The illuminator profiles of different exposure tools produce different optical proximity effects (OPE) even when the nominal illumination parameters are the same. Universal metrics for characterizing the illuminator enable lithographers to compensate for the illuminator-related optical proximity correction (OPC) differences, avoiding the need for tool-specific OPC solutions.


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