TITLE

Sematech Teams with University on Immersion Litho

PUB. DATE
May 2006
SOURCE
Electronic News;5/29/2006, Vol. 52 Issue 22, p29
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article reports on the collaboration of Sematech with the University of Queensland in Brisbane, Queensland, to develop resists for 193 nanometer immersion lithography, in 2006. Such lithography has been under development as an answer to certain manufacturing problems at advanced nodes of semiconductor manufacturing. Sematech and university technologists will identify and qualify novel, high-refractive-index polymers for multiple technology generations.
ACCESSION #
21095822

 

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