Topcoat options for immersion resist

Wei, Yayi; Petrillo, K.; Benson, P.
May 2006
Microlithography World;May2006, Vol. 15 Issue 2, p18
Trade Publication
Reviews the advantage and disadvantages of the resist systems that are commonly available for immersion lithography. Details of the topcoat process; Optical and chemical requirements for selecting a developer-soluble topcoat; Defects introduced by topcoats.


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