TITLE

Topcoat options for immersion resist

AUTHOR(S)
Wei, Yayi; Petrillo, K.; Benson, P.
PUB. DATE
May 2006
SOURCE
Microlithography World;May2006, Vol. 15 Issue 2, p18
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reviews the advantage and disadvantages of the resist systems that are commonly available for immersion lithography. Details of the topcoat process; Optical and chemical requirements for selecting a developer-soluble topcoat; Defects introduced by topcoats.
ACCESSION #
21068795

 

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