TITLE

Mask rule standards: A baby step for DfM

AUTHOR(S)
Mason, Mark
PUB. DATE
May 2006
SOURCE
Microlithography World;May2006, Vol. 15 Issue 2, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Features the standardized mask design rules (MDR) for the manufacturing of integrated circuits. Challenges facing a photomask manufacturing facility; Definition of MDR; Tools utilized by the mask manufacturing process.
ACCESSION #
21068792

 

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