Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams

Tanaka, M.; Chu, F.; Shimojo, M.; Takeguchi, M.; Mitsuishi, K.; Furuya, K.
May 2006
Journal of Materials Science;May2006, Vol. 41 Issue 9, p2667
Academic Journal
Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO)5 was performed on both Si (111) and (110) substrates at 673–873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.


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