TITLE

Development of ion sources for materials processing in china

AUTHOR(S)
Zhao, W. J.; Ren, X. T.; Zhao, H. W.
PUB. DATE
March 2006
SOURCE
Review of Scientific Instruments;Mar2006, Vol. 77 Issue 3, p03C113
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
This article reviews the development of ion sources for materials processing and the progress of commercial product of ion sources in China. The various ion-beam processing and the relative needs to ion sources are mentioned and discussed, such as ion sources with ion implantation, plasma immersion ion implantation, ion-beam-assisted deposition, ion-beam deposition, and so on. The states of progress for different kinds of ion sources specially for electron cyclotron resonance/microwave, metal vapor vacuum arc, radio frequency (rf) ion source, end-Hall ion source, and cluster ion source, are given and discussed.
ACCESSION #
20618005

 

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