Cymer launches ArF litho light source

February 2006
Microlithography World;Feb2006, Vol. 15 Issue 1, p22
Trade Publication
Reports on the launch of the XLA 400 fifth-generation MOPA-based light source by Cymer Inc. in Japan in 2006. Features of the light source; Functions of the product; Statement issued by semiconductor equipment industry analyst Klaus Rinnen regarding the product.


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