TITLE

Cymer launches ArF litho light source

PUB. DATE
February 2006
SOURCE
Microlithography World;Feb2006, Vol. 15 Issue 1, p22
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reports on the launch of the XLA 400 fifth-generation MOPA-based light source by Cymer Inc. in Japan in 2006. Features of the light source; Functions of the product; Statement issued by semiconductor equipment industry analyst Klaus Rinnen regarding the product.
ACCESSION #
19833641

 

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