TITLE

Nanoimprint lithography: the semiconductor industry and beyond

AUTHOR(S)
Luesebrink, Helge
PUB. DATE
February 2006
SOURCE
Microlithography World;Feb2006, Vol. 15 Issue 1, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Various versions of nanoimprint lithography have the potential to supercede optical patterning methods in many applications, if a few difficulties can be overcome.
ACCESSION #
19833605

 

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