TITLE

Analysis of ALD-processed thin films by ion-beam techniques

AUTHOR(S)
Putkonen, Matti; Sajavaara, Timo; Niinistö, Lauri; Keinonen, Juhani
PUB. DATE
August 2005
SOURCE
Analytical & Bioanalytical Chemistry;Aug2005, Vol. 382 Issue 8, p1791
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
This review introduces the possibilities of ion-beam techniques for the analysis of thin films and thin-film structures processed by atomic layer deposition (ALD). The characteristic features of ALD are also presented. The analytical techniques discussed include RBS, NRA and ERDA with its variants, viz. the TOF-ERDA and HI-ERDA. The thin film examples are taken from flat-panel display technology (TFEL structures) and the semiconductor industry (high- k insulators).
ACCESSION #
19148612

 

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