TITLE

Fast RET verification in a box?

AUTHOR(S)
Martin, Patrick; Progler, Chris; Wiley, Jim
PUB. DATE
November 2005
SOURCE
Microlithography World;Nov2005, Vol. 14 Issue 4, p14
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Features the resolution-enhancement techniques which deep-subwavelength lithography requires. Discussion on image-based lithography simulation modeling; Stages in lithography simulation; Applications of the techniques.
ACCESSION #
18839641

 

Related Articles

  • Modeling becomes key to advanced and double-patterned lithography. M. D. L. // Solid State Technology;Apr2007, Vol. 50 Issue 4, p24 

    The article focuses on the growing need for resolution enhancement techniques in advanced and double-patterned lithography. It discusses Invarium Inc.'s application of simulation models for lithography processing. Apo Sezginer, chief technical officer at Invarium Inc., points out that the...

  • The Contention Resolution in OBS Network. Jankuniene, R.; Tervydis, P. // Electronics & Electrical Engineering;2014, Vol. 20 Issue 6, p144 

    Burst contention occurs when attempting to transmit several optical bursts at the time into the same core router output port. This is a shortcoming of the Optical Burst Switching (OBS) networks and for this reason it has been challenging to implement the OBS mode into the transport networks so...

  • Intensity analysis of overlapped discrete and continuous absorption by spectral simulation: The electronic transition moment for the B-X system in I2. Tellinghuisen, Joel // Journal of Chemical Physics;2/28/2011, Vol. 134 Issue 8, p084301 

    The spectrum of I2 is examined anew in the wavelength region 520-640 nm, where discrete absorption in the B-X transition is prominent. The spectrum is recorded with high quantitative precision at moderate resolution (0.1 nm) and is analyzed by least-squares spectral simulation, yielding the B-X...

  • Fast reconstruction of hyperspectral radiative transfer simulations by using small spectral subsets: application to the oxygen A band. Hollstein, A.; Lindstrot, R. // Atmospheric Measurement Techniques Discussions;2013, Vol. 6 Issue 5, p8339 

    Hyperspectral radiative transfer simulations are a versatile tool in remote sensing but can pose a major computational burden. We describe a simple method to construct hyperspectral simulation results by using only a small spectral subsample of the simulated wavelength range, thus leading to...

  • A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm. Yi Xiong; Zhaowei Liu; Xiang Zhang // Applied Physics Letters;5/18/2009, Vol. 94 Issue 20, p203108 

    We propose that a hyperlens can be used for photolithography to generate deep subwavelength arbitrary patterns from diffraction-limited masks. Numerical simulation shows that half-pitch resolution down to 20 nm is possible from a mask with 280 nm period at working wavelength 375 nm. We also...

  • Microlithography process development with lithography simulation. Lewellen, John; Brooker, Peter; Naber, Bob; Hofmann, Uli // Microlithography World;Feb2005, Vol. 14 Issue 1, p8 

    Microlithography simulation is now a compulsory engineering tool, coping with the gap between exposure wavelength and the resolution required by Moore's Law. Rigorous simulation has been a key factor in the development and verification of today's resolution enhancement technologies, and has...

  • Sub-wavelength Lithography and Variability Aware SRAM Characterization. Dobrovolný, Petr; Miranda, Miguel; Zuber, Paul // Radioengineering;Apr2012, Vol. 21 Issue 1, p219 

    With shrinking of minimum feature size of advanced technology nodes, the impact of litho process variations on the resulting electrical parameters of printed circuits dramatically increases. Litho process variations correspond to random changes in the actual optical conditions (dose and focus)...

  • Extreme ultraviolet holographic lithography: Initial results. Cheng, Yang-Chun; Isoyan, Artak; Wallace, John; Khan, Mumit; Cerrina, Franco // Applied Physics Letters;1/8/2007, Vol. 90 Issue 2, p023116 

    The authors report the initial results from a holographic lithography technique using extreme ultraviolet (EUV) radiation. This approach removes the need for complex EUV reflective masks and optics, replacing them with a binary, nanopatterned transmission mask. Computer generated holograms were...

  • The Effect of Focusing on the Lateral Resolution of an Interference Microscope. Levin, G.; Moiseev, N.; Ilyushin, Ya.; Minaev, V. // Measurement Techniques;Apr2014, Vol. 57 Issue 1, p69 

    The dependence of the lateral resolution of an interference microscope on the distance between the phase step and the focal plane of the objective of the microscope object channel is analyzed. The results of measurements at several wavelengths, obtained by numerical modeling over a wide range of...

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics