Shape goes critical for sub-100nm process control

Foucher, J.; Sundaram, G.; Gorelikov, D.
November 2005
Microlithography World;Nov2005, Vol. 14 Issue 4, p8
Trade Publication
Discusses the importance of feature shape control to critical dimension scanning electron microscopy (CD-SEM). Function of CD-SEM; Way to achieve low beam energy in a SEM; Information on critical shape metrology.


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