TITLE

Shape goes critical for sub-100nm process control

AUTHOR(S)
Foucher, J.; Sundaram, G.; Gorelikov, D.
PUB. DATE
November 2005
SOURCE
Microlithography World;Nov2005, Vol. 14 Issue 4, p8
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Discusses the importance of feature shape control to critical dimension scanning electron microscopy (CD-SEM). Function of CD-SEM; Way to achieve low beam energy in a SEM; Information on critical shape metrology.
ACCESSION #
18839634

 

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