Patterning of hydrogenated microcrystalline silicon growth by magnetic field

Fejfar, A.; Stuchlík, J.; Mates, T.; Ledinský, M.; Honda, S.; KocÇka, J.
July 2005
Applied Physics Letters;7/4/2005, Vol. 87 Issue 1, p011901
Academic Journal
A way of influencing growth of silicon films by magnetic field is demonstrated. Permanent magnet(s) placed under the substrate influenced the discharge in a mixture of silane and hydrogen and led to formation of microcrystalline regions in otherwise amorphous film. The pattern of microcrystalline regions varied with the orientation of the magnetic field. Microscopic study by atomic force microscopy and by micro-Raman spectroscopy revealed that the microcrystalline regions resulted from a higher density of crystalline grain nuclei, increased at the locations where the magnetron effect could be expected. This phenomenon could be used to study the transition between amorphous and microcrystalline growth. Moreover, we suggest it as a kind of “magnetic lithography” for the preparation of predefined microcrystalline patterns in otherwise amorphous silicon films.


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