TITLE

Litho enhancements for 45nm-node MuGFETs

AUTHOR(S)
Verhaegen, Staf; Ercken, Monique; Nackaerts, Axel; Vandenberghe, Geerl
PUB. DATE
August 2005
SOURCE
Microlithography World;Aug2005, Vol. 14 Issue 3, p14
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Discusses the lithographic enhancements for multigate field-effect transistors. Improvement of fin-width control; Disadvantages of using quasar illumination for improved corner rounding; Utilization of a software to help in the optimization of the illumination condition.
ACCESSION #
17907209

 

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