Litho enhancements for 45nm-node MuGFETs

Verhaegen, Staf; Ercken, Monique; Nackaerts, Axel; Vandenberghe, Geerl
August 2005
Microlithography World;Aug2005, Vol. 14 Issue 3, p14
Trade Publication
Discusses the lithographic enhancements for multigate field-effect transistors. Improvement of fin-width control; Disadvantages of using quasar illumination for improved corner rounding; Utilization of a software to help in the optimization of the illumination condition.


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