TITLE

The death of the aerial image

AUTHOR(S)
Mack, Chris A.
PUB. DATE
August 2005
SOURCE
Microlithography World;Aug2005, Vol. 14 Issue 3, p12
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Focuses on the aerial image in semiconductor lithography. Information on aerial image, the image of a photomask projected onto the plane of the wafer; Effects of high numerical-aperture (NA) on imaging; Determination of the amount of interference between two electric fields; Reason behind the aerial image being a bad proxy for the final resist image for high-NA imaging.
ACCESSION #
17907199

 

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