TITLE

Resist blur and line-edge roughness

AUTHOR(S)
Gallatin, Gregg M.
PUB. DATE
August 2005
SOURCE
Microlithography World;Aug2005, Vol. 14 Issue 3, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Discusses the origin and characteristics of photoresist line-edge roughness (LER). Utilization of a standard edge-finding algorithm to determine a line edge; Association of polymer size with LER; Introduction of a model to explain the characteristic behavior of LER, including its scaling laws.
ACCESSION #
17907182

 

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