Ge diffusion in Ge metal oxide semiconductor with chemical vapor deposition HfO2 dielectric

Lu, N.; Bai, W.; Ramirez, A.; Mouli, C.; Ritenour, A.; Lee, M. L.; Antoniadis, D.; Kwong, D. L.
August 2005
Applied Physics Letters;8/1/2005, Vol. 87 Issue 5, p051922
Academic Journal
We report a study on Ge diffusion and its impact on the electrical properties of TaN/HfO2/Ge metal-oxide-semiconductor (MOS) device. It is found that Ge diffusion depends on the amount of GeO2 formed at the HfO2/Ge interface and can be retarded by surface nitridation. It is speculated that Ge diffusion is in the form of GeO or Ge-riched HfGeO. Effective suppression of Ge diffusion by NH3 nitridation has resulted in improved electrical properties of TaN/HfO2/Ge MOS device, including equivalent oxide thickness (EOT), leakage current, hysteresis, and interface state density. The degradation of leakage current after high temperature post metallization anneal (PMA) is found to be due to Ge diffusion.


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