Chemical sputtering of carbon by nitrogen ions

Jacob, W.; Hopf, C.; Schlüter, M.
May 2005
Applied Physics Letters;5/16/2005, Vol. 86 Issue 20, p204103
Academic Journal
Chemical sputtering of amorphous hydrogenated carbon layers by nitrogen molecular ions was studied as a function of the ion energy in the range from 30 to 900 eV. The sputtering yield shows only a very weak variation with energy in the range from 900 down to 50 eV. For lower energies it decreases significantly. This behavior is interpreted as an indication of chemical sputtering.


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