TITLE

Chemical sputtering of carbon by nitrogen ions

AUTHOR(S)
Jacob, W.; Hopf, C.; Schlüter, M.
PUB. DATE
May 2005
SOURCE
Applied Physics Letters;5/16/2005, Vol. 86 Issue 20, p204103
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Chemical sputtering of amorphous hydrogenated carbon layers by nitrogen molecular ions was studied as a function of the ion energy in the range from 30 to 900 eV. The sputtering yield shows only a very weak variation with energy in the range from 900 down to 50 eV. For lower energies it decreases significantly. This behavior is interpreted as an indication of chemical sputtering.
ACCESSION #
17164873

 

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