Epitaxial growth of NaxCoO2 thin films by pulsed-laser deposition

Krockenberger, Y.; Fritsch, I.; Cristiani, G.; Matveev, A.; Alff, L.; Habermeier, H.-U.; Keimer, B.
May 2005
Applied Physics Letters;5/9/2005, Vol. 86 Issue 19, p191913
Academic Journal
Single-phase thin films of NaxCoO2 have been grown epitaxially by pulsed-laser deposition technique. The growth conditions were studied based on the log pO2-1/T phase diagram of Co–O2 using different types of substrate materials. For Na0.58CoO2, metallic behavior is found down to 4.2 K.


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