TITLE

AAPSM space-imbalance reduction for 65nm lithography

AUTHOR(S)
Jhaveri, Tejas; Cottle, Rand; Yuan Zhang; Progler, Christopher J.
PUB. DATE
May 2005
SOURCE
Microlithography World;May2005, Vol. 14 Issue 2, p16
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Presents a study which focused on alternating-aperture phase-shifting mask (AAPSM) space-imbalance reduction for 65-nanometer lithography. Improvement of space CD bias by the transparent etch-stop layer technology; Minimization of defocus variations by optimization of phase depth; Manufacturability of the technologies applied for 65-nanometer lithography.
ACCESSION #
16990917

 

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