AAPSM space-imbalance reduction for 65nm lithography

Jhaveri, Tejas; Cottle, Rand; Yuan Zhang; Progler, Christopher J.
May 2005
Microlithography World;May2005, Vol. 14 Issue 2, p16
Trade Publication
Presents a study which focused on alternating-aperture phase-shifting mask (AAPSM) space-imbalance reduction for 65-nanometer lithography. Improvement of space CD bias by the transparent etch-stop layer technology; Minimization of defocus variations by optimization of phase depth; Manufacturability of the technologies applied for 65-nanometer lithography.


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