TITLE

Bottom antireflection coatings for high numerical aperture imaging

AUTHOR(S)
Mack, Chris A.
PUB. DATE
May 2005
SOURCE
Microlithography World;May2005, Vol. 14 Issue 2, p12
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Presents a study which focused on bottom antireflection coatings for high numerical aperture imaging in lithography. Limitations of bottom antireflective coatings; Formation of an aerial image by the interference of plane waves; Significance of immersion technology to the fabrication of the 45-nanometer generation of semiconductor devices.
ACCESSION #
16990898

 

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