Self-assembly of faceted Ni nanodots on Si(111)

Aurongzeb, D.; Patibandla, S.; Holtz, M.; Temkin, H.
March 2005
Applied Physics Letters;3/7/2005, Vol. 86 Issue 10, p103107
Academic Journal
We report the formation of Ni nanodots on Si(111). Island density is varied by annealing temperature and time and is studied using atomic force microscopy (AFM) and magnetic force microscopy. Activation energies of 0.09±0.02 and 0.31±0.05 eV are observed for the formation of these islands. These are associated with Ni surface self-diffusion across the (111) and (110) Ni facets, respectively. For brief 500 °C anneals, regular nanodots are observed with self-limiting sizes of height ∼16 nm and area 180 nm×260 nm, while density exhibits a power-law time dependence with exponent 1.13±0.12. AFM analysis reveals a “truncated hut” shape consistent with (110) top and (111) sidewall surfaces.


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