TITLE

Low temperature internal friction in nanocrystalline diamond films

AUTHOR(S)
Metcalf, Thomas H.; Xiao Liu; Houston, Brian H.; Baldwin, Jeffrey W.; Butler, James E.; Feygelson, Tatyana
PUB. DATE
February 2005
SOURCE
Applied Physics Letters;2/21/2005, Vol. 86 Issue 8, p081910
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Measurements of the temperature dependence of the internal friction and frequency of three nanocrystalline diamond films grown on silicon oscillator substrates indicate that the mechanical properties of the films are dominated by their interface layers. The films, with thicknesses of 0.3, 0.6, and 1.14 μm, were measured between 0.4 K and room temperature and have low temperature (below 10 K) internal frictions between 2×10-6 and 5×10-6, which is an order of magnitude lower than has been reported previously. Additionally, all films display an internal friction peak at approximately 1.7 K. The shear modulus of the films, 545–551 GPa, is comparable to that for single-crystal diamond.
ACCESSION #
16581361

 

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