X-ray diffraction measurements of internal strain in Si nanowires fabricated using a self-limiting oxidation process

Shimura, Takayoshi; Yasutake, Kiyoshi; Umeno, Masataka; Nagase, Masao
February 2005
Applied Physics Letters;2/14/2005, Vol. 86 Issue 7, p071903
Academic Journal
We demonstrate x-ray diffraction measurements of internal strain in Si nanowires that were fabricated using a self-limiting oxidation process. Rod-shaped scattering around the 111 Bragg point due to interference effects from the Si nanowires were observed, which are robust reflections for incoherent displacement of the wires. From the shifts of the scattering in reciprocal space, the strain was estimated to be 1.0–1.5×10-3 for the sample oxidized at 800 °C for 300 min.


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