TITLE

Microlithography process development with lithography simulation

AUTHOR(S)
Lewellen, John; Brooker, Peter; Naber, Bob; Hofmann, Uli
PUB. DATE
February 2005
SOURCE
Microlithography World;Feb2005, Vol. 14 Issue 1, p8
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Microlithography simulation is now a compulsory engineering tool, coping with the gap between exposure wavelength and the resolution required by Moore's Law. Rigorous simulation has been a key factor in the development and verification of today's resolution enhancement technologies, and has begun to influence manufacturing. A new platform enables different configurations for engineering and manufacturing while retaining a common database and key capabilities such as rigorous topographic simulation on both mask and wafer, integrated mask layout capability, and process window analysis.
ACCESSION #
16070865

 

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