TITLE

The history and potential of maskless e-beam lithography

AUTHOR(S)
Pfeiffer, Hans C.
PUB. DATE
February 2005
SOURCE
Microlithography World;Feb2005, Vol. 14 Issue 1, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Maskless lithography is currently being pursued as an "emerging technology" in response to rapidly escalating mask costs and demands for quicker turnaround time. This article provides a historic perspective illustrating that maskless lithography (ML2) in the form of e-beam direct write has been utilized successfully in the semiconductor manufacturing process for several decades. This is followed by a brief discussion of new e-beam ML2 approaches.
ACCESSION #
16070860

 

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