Direct observation of interstitial molecular N2 in Si oxynitrides

Chung, Youngsu; Lee, Jae Cheol; Shin, H. J.
January 2005
Applied Physics Letters;1/10/2005, Vol. 86 Issue 2, p022901
Academic Journal
High-resolution near edge x-ray absorption spectroscopy and x-ray photoelectron spectroscopy were used to characterize ultrathin plasma-nitrided silicon oxides. The direct observation of interstitial molecular N2 was made by vibrationally resolved N K-edge absorption spectroscopy. The N2 molecules were trapped during the plasma nitridation at the near surface and could be eliminated by annealing via molecular out-diffusion.


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