Diffraction effects in optical interferometric displacement detection in nanoelectromechanical systems

Kouh, T.; Karabacak, D.; Kim, D. H.; Ekinci, K. L.
January 2005
Applied Physics Letters;1/3/2005, Vol. 86 Issue 1, p013106
Academic Journal
Optical interferometric displacement detection techniques have recently found use in the study of nanoelectromechanical systems (NEMS). Here, we study the effectiveness of these techniques as the relevant NEMS dimensions are reduced beyond the optical wavelength used. We first demonstrate that optical cavities formed in the sacrificial gaps of subwavelength NEMS enable enhanced displacement detection sensitivity. In a second set of measurements, we show that the displacement sensitivity of conventional path-stabilized Michelson interferometry degrades rapidly beyond the diffraction limit. Both experiments are consistent with numerical models.


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