Selection of an oxidant for copper chemical mechanical polishing: Copper-iodate system

Anik, M.
January 2005
Journal of Applied Electrochemistry;Jan2005, Vol. 35 Issue 1, p1
Academic Journal
Diagnostic criteria were developed to elucidate the reduction mechanism of an oxidant on a copper (Cu) surface at the corrosion potential. The corrosion potential of Cu tu was measured for various pH and iodate (IO) concentrations using the rotating disk electrode technique. According to the measured corrosion potentials, IOwas an effective CMP oxidant only below pH Application of the diagnostic criteria on the Cu - IOsystem showed that the reduction of IOon Cu was under the mixed kinetic and diffusion control at the corrosion potentia l below pH 3. Above pH 3, however, the anodic process dominated over the cathodic process.


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